| Model | ME-210 |
|---|---|
| Measurement Method |
PCA (Parallel Processing Method for Photonic Crystal Array) Film Thickness: 0.1nm, Refractive Index: 0.001* |
| Measurement Repeatability | Thickness: 0.1nm, Refractive Index: 0.001 |
| Light Source | Semiconductor Laser (Typical value: 636nm) |
| Measurement Spot Size |
- Wide Area Mode: 0.55mm square - Mid-Range Mode: 55μm square - High-Quality Mode: 5.5μm square |
| Angle of Incidence | Standard 70 degrees |
| Stage Size | Maximum Sample Diameter: 8 inches |
| Measurement Speed | Maximum >20,000 points/minute (high-resolution measurement) |
| Product Contents | Complete system software (installation CD), standard samples, instruction manual |
| Notes |
*Standard deviation value when measuring one point on a SiO₂ film on Si (approximately 100 nm thick) 100 times. *Specifications are subject to change without prior notice. |